Invited talk on Atomic Layer Deposition, by associate professor Riikka Puurunen, at the COST MP1402 (HERALD) event, Riika, Latvia, May 22, 2017.

On the history and future of ALD: VPHA, conformality analysis, mechanisms 

 Topics: 1) History of atomic layer deposition (ALD) 2) Conformality analysis of ALD and other thin films 3) Surface chemistry questions in ALD Presentation dedicated to the memory of Mr. Sven Lindfors, pioneer in building ALD reactors, close collaborator of Dr. Tuomo Suntola from 1975. 

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Last modified: Sunday, 23 May 2021, 4:50 PM