Invited, Riikka Puurunen, at COST MP1402 HERALD, Riika, May 22, 2017 [page]
On the history and future of ALD: VPHA, conformality analysis, mechanisms
1) History of atomic layer deposition (ALD)
2) Conformality analysis of ALD and other thin films
3) Surface chemistry questions in ALD
Presentation dedicated to the memory of Mr. Sven Lindfors, pioneer in building ALD reactors, close collaborator of Dr. Tuomo Suntola from 1975.