Machball for simulating atomic layer deposition [URL]

Machball models the reactive transport inside high aspect ratio and nanostructured materials for self-limited processes such as atomic layer deposition (ALD) and atomic layer etching (ALE). Machball was developed at Argonne National Laboratory. At the time of publication, the team comprised: Angel Yanguas-Gil,, Lead and founder; Jeffrey W Elam. Related publicationA. Yanguas-Gil and J. W. Elam, A Markov chain approach to simulate Atomic Layer Deposition chemistry and transport inside nanostructured substrates, Theoretical Chemistry Accounts 133 (2014) art. 1465.

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