Event webpage: https://www.aalto.fi/en/events/2021-november-networking-ald-at-aalto-university

Programme consisted of brief introduction to ALD (Puurunen), invited lectures (van Ommen, Malygin, Barry), status update of the Virtual Project on the History of ALD (VPHA; Puurunen), sponsor highlights (Beneq, Picosun) and posters. Records of the introduction to ALD, the invited talks and the VPHA status update are shared here. Records of the opening and closing of the event are made available via this page as well.

Opening of the event

Speaker: Prof. Riikka Puurunen, Aalto University

https://aalto.cloud.panopto.eu/Panopto/Pages/Viewer.aspx?id=f15cd149-99ee-47b1-9e79-adef00c877f7 Note: record did not start from the beginning

Brief introduction to atomic layer deposition (ALD), Puurunen 

Speaker: Prof. Riikka Puurunen, Aalto University


Invited: "An ALD chapter in Kirk-Othmer Encyclopedia of Chemical Technology: both for beginners and experts”, van Ommen

Speaker: Prof. Ruud van Ommen, Delft University of Technology


"Virtual Project on the History of ALD in perspective: past, present and future", Puurunen

Speaker: Prof. Riikka Puurunen, Aalto University


Invited: "Molecular layering method - from the 20th to the 21st century”, Malygin

Speaker: Prof. Anatolii Malygin,St. Petersburg State Institute of Technology


Invited: “Surface reactions: how do they work?” Barry

Speaker: Prof. Sean Barry, Carleton University: 


Opening and closing of the event

Speaker: Prof. Riikka Puurunen, Aalto University


Last modified: Monday, 20 December 2021, 9:56 AM