Atomic Layer Deposition (ALD)

Machball models the reactive transport inside high aspect ratio and nanostructured materials for self-limited processes such as atomic layer deposition (ALD) and atomic layer etching (ALE). Machball was developed at Argonne National Laboratory. At the time of publication, the team comprised: Angel Yanguas-Gil, ayg@anl.gov, Lead and founder; Jeffrey W Elam. Related publication: A. Yanguas-Gil and J. W. Elam, A Markov chain approach to simulate Atomic Layer Deposition chemistry and transport inside nanostructured substrates, Theoretical Chemistry Accounts 133 (2014) art. 1465. http://doi.org/10.1007/s00214-014-1465-x