On the fundamentals of ALD: the importance of getting the picture right

Live record of a presentation at the AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020), online, 29.6.-1.7.2020, https://ald2020.avs.org/. Authors and presenters: Riikka L. Puurunen and J. Ruud van Ommen.

Video available in Youtube:  . 

Video also available through Panopto and slides in SlideShare. Related blog post in Catalysis Professor's Open: https://blogs.aalto.fi/catprofopen/2020/07/05/on-the-fundamentals-of-ald-the-importance-of-getting-the-picture-right-by-puurunen-and-van-ommen/. 



Остання зміна: неділя 23 травня 2021 16:49 PM