Workshop on ALD fundamentals, TU Delft, Jul 3, 2019 [page]
One of the activities during my visit was: Workshop on Fundamentals of Atomic Layer Deposition: Modelling and Validation, July 3rd 2019, TU Delft, The Netherlands, organized by Dr. Fatemeh Hashemi and Prof. Ruud van Ommen.
Riikka Puurunen (invited): Surface coverage in ALD
Angel Yanguas-Gil (invited): From nanoscience to nanomanufacturing: a simulation approach to understanding throughput and conformality of atomic layer deposition
Fabio Grillo: Kinetic Modeling of Island-Growth during Atomic Layer Deposition - Linking Experimental Observations to Mechanisms
Viimeksi muutettu: sunnuntaina 23. toukokuuta 2021, 16.50