One of the activities during my visit was: Workshop on Fundamentals of Atomic Layer Deposition: Modelling and Validation, July 3rd 2019, TU Delft, The Netherlands, organized by Dr. Fatemeh Hashemi and Prof. Ruud van Ommen. 

Riikka Puurunen (invited): Surface coverage in ALD

Riikka Puurunen presenting

Angel Yanguas-Gil (invited): From nanoscience to nanomanufacturing: a simulation approach to understanding throughput and conformality of atomic layer deposition

Yangel Yanguas-Gil presenting and being introduced by host

Fabio Grillo: Kinetic Modeling of Island-Growth during Atomic Layer Deposition - Linking Experimental Observations to Mechanisms

Fabio Grillo presenting

Last modified: Sunday, 23 May 2021, 4:50 PM