Atomic Layer Deposition (ALD)
Osion kuvaus
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Twitter bot @CVD_ALD_papers surveying publications on ALD & CVD. Operated by researchers at Ruhr University. List of journals checked: imc.ruhr-uni-bochum.de/twitter-list/. Filter here for [the bot & #ALDep]. (Possibly no longer operational, as not note 2023-07-29.)
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Atomic Limits blog and website by Prof. Erwin Kessels and collaborators. Contains, for example:
Minireview, dated 8.2.2020: "Basic insights into ALD conformality – A closer look at ALD and thin film conformality"
Minireview, dated 12.2.2019: "Atomic Layer Deposition Process Development – 10 steps to successfully develop, optimize and characterize ALD recipes"
Perspective, dated 21.12.2018: "Towards Area-Selective Atomic Layer Deposition with High Selectivity – Our perspective on area-selective ALD"
- ALD Database, Building upon materials from https://doi.org/10.1063/1.1940727, https://doi.org/10.1063/1.4757907, etc. Organises ALD processes for specific materials Reactant A, B, C,... Users can suggest additions.
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BALD Engineering blog on Atomic Layer Processing (that is: atomic layer deposition and atomic layer etching) by Dr. Jonas Sundqvist
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Plasma ALD publication database updated by Dr. Mark Sowa
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"Educating students and professionals about the principles, applications and advancements in atomic layer deposition". Founded by Prof. Gregory Parsons and Prof. Erwin Kessels.
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