Osion kuvaus

  • Welcome!

    Welcome to the OpenLearning site on Atomic Layer Deposition (ALD)! To the author's knowledge, this is the first open learning and teaching platform on ALD worldwide. 

    At the time of its opening on November 29, 2019, this site mainly contains links to openly available learning materials on ALD, to be explored at everyone's own pace. The opening materials include (i) a brief introduction to ALD including a cartoon illustration, (ii) a compilation of review articles on ALD (there are over 200!) and a curated list of recommended reviews, and (iii) an evolving compilation of doctoral theses worldwide (there are over 500!) being created in the framework of the open science effort "Virtual Project on the History of ALD" (VPHA). Additional links are presented to contents likely to be helpful and interesting for newcomers in the expanding field of ALD. The date of opening the site has been chosen to celebrate the filing of the first patent on Atomic Layer Epitaxy by Suntola and Antson, exactly forty-five years earlier. 

    In the future, the plan is to expand the site. How exactly, the details are still to be thought of. The purpose is to make this site a community effort, and the users are welcome to propose content to and jointly improve the site. Do you have feedback? Please share it via the anonymous survey https://webropol.com/s/ald-openlearning-initial-feedback (the survey can be answered many times). 

    Espoo, Finland, 
    Released November 29, 2019 

    Riikka Puurunen 
    Associate Professor, Catalysis Science and Technology, Aalto University

    P.S. The multilingual "banner" of the site has been created on the basis of discussion carried out in the ALD - Atomic Layer Deposition LinkedIn site a few years ago. 

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Introduction to atomic layer deposition (ALD)